ASTM-F1709:2016 Edition
$35.75
F1709-97(2016) Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
Published By | Publication Date | Number of Pages |
ASTM | 2016 | 3 |
ASTM F1709-97-Reapproved2016
Withdrawn Standard: Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2023)
ASTM F1709
Scope
1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.
1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.
1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.
Keywords
coating; sputtering; target; thin film; titanium ;
ICS Code
ICS Number Code 31.120 (Electronic display devices)
DOI: 10.1520/F1709-97R16