BSI PD ISO/TS 25138:2019 – TC:2020 Edition
$246.62
Tracked Changes. Surface chemical analysis. Analysis of metal oxide films by glow-discharge optical-emission spectrometry
| Published By | Publication Date | Number of Pages |
| BSI | 2020 | 100 |
PDF Catalog
| PDF Pages | PDF Title |
|---|---|
| 52 | undefined |
| 57 | Foreword |
| 59 | 1 Scope 2 Normative references 3 Terms and definitions |
| 60 | 4 Principle 5 Apparatus 5.1 Glow-discharge optical-emission spectrometer 5.1.1 General 5.1.2 Selection of spectral lines |
| 61 | 5.1.3 Selection of glow-discharge source type |
| 62 | 6 Adjusting the glow-discharge spectrometer system settings 6.1 General 6.2 Setting the parameters of a DC source 6.2.1 Constant applied current and voltage |
| 63 | 6.2.2 Constant applied current and pressure |
| 64 | 6.2.3 Constant voltage and pressure 6.3 Setting the discharge parameters of an RF source 6.3.1 General 6.3.2 Constant applied voltage and pressure |
| 65 | 6.3.3 Constant applied power and DC bias voltage 6.3.4 Constant effective power and RF voltage 6.4 Minimum performance requirements 6.4.1 General |
| 66 | 6.4.2 Minimum repeatability 6.4.3 Detection limit |
| 67 | 7 Sampling |
| 68 | 8 Calibration 8.1 General 8.2 Calibration samples 8.2.1 General 8.2.2 Low alloy iron or steel samples |
| 69 | 8.2.3 Stainless-steel samples 8.2.4 Nickel alloy samples 8.2.5 Copper alloy samples 8.2.6 Titanium alloy samples 8.2.7 Silicon samples 8.2.8 Aluminium alloy samples 8.2.9 High-oxygen samples 8.2.10 High-carbon samples 8.2.11 High-nitrogen samples 8.2.12 High-hydrogen samples 8.2.13 High-purity copper samples |
| 70 | 8.3 Validation samples 8.3.1 General 8.3.2 Hot-rolled low-alloy steel 8.3.3 Oxidized silicon wafers 8.3.4 TiN-coated samples 8.3.5 Anodized Al2O3 samples 8.3.6 TiO2-coated samples 8.4 Determination of the sputtering rate of calibration and validation samples |
| 72 | 8.5 Emission intensity measurements of calibration samples 8.6 Calculation of calibration formulae 8.7 Validation of the calibration 8.7.1 General |
| 73 | 8.7.2 Checking analytical accuracy using bulk reference materials 8.7.3 Checking analytical accuracy using metal oxide reference materials 8.8 Verification and drift correction |
| 74 | 9 Analysis of test samples 9.1 Adjusting discharge parameters 9.2 Setting of measuring time and data acquisition rate 9.3 Quantifying depth profiles of test samples |
| 75 | 10 Expression of results 10.1 Expression of quantitative depth profile 10.2 Determination of metal oxide mass per unit area |
| 76 | 10.3 Determination of the average mass fractions of the elements in the oxide 11 Precision |
| 77 | 12 Test report |
| 78 | Annex A (informative) Calculation of calibration constants and quantitative evaluation ofdepth profiles |
| 90 | Annex B (informative) Suggested spectral lines for determination of given elements |
| 92 | Annex C (informative) Examples of oxide density and the corresponding quantity ρO |
| 93 | Annex D (informative) Report on interlaboratory testing of metal oxide films |
| 98 | Bibliography |
