BS ISO 17560:2014
$102.76
Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of boron in silicon
Published By | Publication Date | Number of Pages |
BSI | 2014 | 22 |
This International Standard specifies a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon, and using stylus profilometry or optical interferometry for depth scale calibration. This method is applicable to single-crystal, poly-crystal, or amorphous silicon specimens with boron atomic concentrations between 1 × 1016 atoms/cm3 and 1 × 1020 atoms/cm3, and to crater depths of 50 nm or deeper.
PDF Catalog
PDF Pages | PDF Title |
---|---|
6 | Foreword |
7 | Introduction |
9 | Section sec_1 Section sec_2 Section sec_3 1 Scope 2 Normative reference 3 Symbols and abbreviations |
10 | Section sec_4 Section sec_5 Section sec_5.1 Section sec_5.2 Section sec_6 Section sec_6.1 Section sec_6.2 4 Principle 5 Reference materials 5.1 Reference materials for determination of relative-sensitivity factors 5.2 Reference materials for calibration of depth scale 6 Apparatus 6.1 Secondary-ion mass spectrometer 6.2 Stylus profilometer |
11 | Section sec_6.3 Section sec_7 Section sec_8 Section sec_8.1 Section sec_8.1.1 Table tab_1 Table tab_2 Section sec_8.1.2 Section sec_8.2 Section sec_8.2.1 Section sec_8.2.2 Section sec_8.2.3 6.3 Optical interferometer 7 Specimen 8 Procedure 8.1 Adjustment of secondary-ion mass spectrometer 8.2 Optimizing the secondary-ion mass spectrometer settings |
12 | Section sec_8.3 Section sec_8.4 Section sec_8.4.1 Section sec_8.4.2 Section sec_8.5 Section sec_8.5.1 Section sec_8.5.2 Section sec_8.5.3 8.3 Specimen introduction 8.4 Detected ions 8.5 Measurement of test specimen |
13 | Section sec_8.6 Section sec_8.6.1 Section sec_8.6.2 Section sec_8.6.2.1 Section sec_8.6.2.2 Section sec_8.6.3 Section sec_8.6.3.1 Section sec_8.6.3.2 Figure fig_1 Section sec_8.6.3.3 8.6 Calibration |
14 | Section sec_9 Section sec_9.1 Section sec_9.2 Section sec_9.3 Section sec_9.4 Section sec_9.5 Section sec_9.6 9 Expression of results |
15 | Section sec_10 10 Test report |
16 | Annex sec_A Annex sec_A.1 Annex sec_A.2 Annex sec_A.3 Annex sec_A.4 Annex sec_A.5 Annex sec_A.5.1 Annex sec_A.5.2 Annex A (informative) Statistical report of stylus profilometry measurements |
17 | Annex sec_A.6 Table tab_A.1 |
18 | Reference ref_1 Reference ref_2 Reference ref_3 Bibliography |