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ASTM-E2245 2011

$58.50

E2245-11 Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer

Published By Publication Date Number of Pages
ASTM 2011 24
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1.1 This test method covers a procedure for measuring the compressive residual strain in thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an interferometer. Measurements from fixed-fixed beams that are touching the underlying layer are not accepted.

1.2 This test method uses a non-contact optical interferometer with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.

1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.

PDF Catalog

PDF Pages PDF Title
1 Scope
Referenced Documents
Terminology
4 Summary of Test Method
FIG. 1
5 Significance and Use
FIG. 2
FIG. 3
6 Interferences
FIG. 4
FIG. 5
7 Test Units
FIG. 6
TABLE 1
8 Procedure (
9 FIG. 7
10 FIG. 8
FIG. 9
11 FIG. 10
12 Calculation (
FIG. 11
13 FIG. 12
FIG. 13
15 Report
Precision and Bias
16 Keywords
TABLE 2
FIG. 14
17 FIG. 15
FIG. 16
18 A1. CALCULATION OF COMBINED STANDARD UNCERTAINTY
A1.1
A1.2
A1.3
A1.4
A1.5
A1.6
A1.7
A1.8
A1.9
A1.10
19 TABLE A1.1
20 A1.11
A1.12
A1.13
A1.14
A1.15
TABLE A1.2
TABLE A1.3
TABLE A1.4
21 X1. ADHERENCE OF SURFACE-MICROMACHINED FIXED-FIXED BEAM TO UNDERLYING LAYER
X1.1
FIG. X1.1
22 FIG. X1.2
FIG. X1.3
23 REFERENCES
FIG. X1.4
ASTM-E2245 2011
$58.50